Dual-interferometer method for measuring bending of materials
US6495819B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2000 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Aug 8, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/161
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of two interferometric configurations to measure bending of an extended element. The measurement arm of each configuration is a long optical fiber. A first interferometric configuration has a segment of its measurement arm attached to one side of the element. The second interferometric configuration has a segment of its measurement arm attached to one side of the element and another segment of its measurement arm attached to an opposing side of the element. The two configurations are used to obtain two sets of interference fringe measurement values. If one set is subtracted from the other, the result is intensity differential values that indicate only the effects of bending and not of temperature or pressure. Variations of the method can be used for irregularly shaped elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.