Apparatus and method for rapid thermal processing
US6496648B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 1999 |
| Grant date | Dec 17, 2002 |
| Priority date | — |
| Expiry date | Aug 19, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B2203/032
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for rapid thermal processing is described and includes a cylindrical lamp array structure (13) surrounding a cylindrical process tube (16). The cylindrical process tube (16) has a lengthwise central axis (22). The cylindrical lamp array structure (13) includes heat sources or lamps (26). The lamps (26) are positioned with respect to the cylindrical process tube (16) so that the sides of the lamps (26) focus light energy in the direction of the lengthwise central axis (22). Substrates (12) are oriented within the cylindrical process tube (16) so that the major surfaces (14) of the substrates (12) are substantially normal to the lengthwise central axis (22). In an alternative embodiment, a magnetic field source (19) is included for processing storage devices such as non-volatile memory devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.