Apparatus and method for objective measurement of optical systems using wavefront analysis
US6497483B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2002 |
| Grant date | Dec 24, 2002 |
| Priority date | — |
| Expiry date | Mar 6, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/00
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An apparatus for determining aberrations of an eye includes a patient head rest allowing for positioning adjustment. The patient head rest is operable with an optical table having a base. The base includes a probe beam generating apparatus, probe beam directing optics which itself comprises a beam splitter; a mirror; and a lens. The probe beam directing optics is capable of directing a probe beam toward an eye of a patient positioned on the patient head rest. Video image components are provided and comprise a light source, a mirror; and a video camera. The video image components are capable of generating an image of an eye of a patient positioned on the patient head rest. Eye fixation components generate a target that the eye of a patient positioned on the patient head rest can view. The eye fixation components comprise a fixation target, a light source, a lens, and a mirror. Wavefront directing and analyzing components measure a wavefront emanating from the eye of a patient positioned on the patient head rest and determine aberrations of the eye that range from at least about + or −1 diopters to at least about + or −6 diopters. The wavefront directing and analyzing com…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.