Method of polishing a magnetic head slider
US6497611B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2001 |
| Grant date | Dec 24, 2002 |
| Priority date | — |
| Expiry date | Mar 5, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3163
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Disclosed is a method of polishing a magnetic head slider whereby a by-processed step can be easily reduced. An air bearing surface of the magnetic head slider is polished with setting a bar that includes the magnetic head slider where a thin film magnetic head element is formed to reciprocate in a radius direction of a polishing plate, as well as rotating the polishing plate having a polishing surface. Polishing steps include a first polishing step of performing a height polish while rotating the polishing plate at a first velocity, and a second polishing step of performing a finishing polish while rotating the polishing plate at a second velocity sufficiently lower than the first velocity. The second velocity at the second polishing step is set so that an average linear velocity in the direction of the rotation of the polishing plate is equal to or lower than 0.032 m/s (preferably equal to or lower than 0.008 m/s). Consequently, the by-processed step that is generated on the air bearing surface of the magnetic head slider is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.