Silver halide light sensitive emulsion layer having enhanced photographic sensitivity
US6498004B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2000 |
| Grant date | Dec 24, 2002 |
| Priority date | — |
| Expiry date | Dec 28, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/55
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
This invention provides a photographic element comprising at least one silver halide emulsion layer in which the silver halide is sensitized with a compound of the formula (a):&Dgr;−(t)m−XY′  (a)XY′−(t)m−&Dgr;  (b)&Dgr;−(t)m−XY′−(t)m−&Dgr;  (c)wherein &Dgr; is protective group that is eliminated during development of the photographic element, t is a timing group, m is an integer from 0 to 3, and XY′ is a fragmentable electron donor moiety in which X is an electron donor group and Y′ is a leaving proton H or a leaving group Y, with the proviso that if Y′ is a proton, a base, &bgr;−, is present in the emulsion or is covalently linked directly or indirectly to X, and wherein:1) X—Y′ has an oxidation potential between 0 and about 1.4 V;2) the oxidized form of X—Y′ undergoes a bond cleavage reaction to give the radical X• and the leaving fragment Y′, and3) the radical X• has an oxidation potential ≦−0.7V.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.