Electrostatic deposition process
US6500493B2 · kind B2 · utility
28Cited by
10References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2001 |
| Grant date | Dec 31, 2002 |
| Priority date | — |
| Expiry date | Apr 14, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/1409
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Fine abrasive powders can be made more free-flowing and better adapted to electrostatic upward projection deposition in the production of coated abrasives by the control of the volume resistivity of the powder to a level that is not greater than 1014 ohms.cm by incorporation of a silica powder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.