Electrophotosensitive material
US6500592B2 · kind B2 · utility
1Cited by
2References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 8, 2001 |
| Grant date | Dec 31, 2002 |
| Priority date | — |
| Expiry date | Nov 8, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/062
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is an electrophotosensitive material comprising a conductive substrate and a photosensitive layer formed on the substrate, the photosensitive layer containing a quinone derivative of the formula (1) and/or (2): (R1, R2, R6 and R7 are alkyl; R3 and R8 are alkyl, alkoxy, aryl, aralkyl, hydrogen or atom; R4 and R5 are alkyl, alkoxy, aryl, aralkyl, hydrogen or halogen, or form a ring by binding each other; X is halogen; m is 1 to 4, n and p are 1 to 4.) The photosensitive material has high sensitivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.