Method of applying a coating by physical vapor deposition

US6503373B2 · kind B2 · utility

Assignees

• Ingersoll-Rand Company · US
• Hauzer Techno Coating Europe BV · NL

Inventors

• Michael J. J. Eerden · Beuningen, NL
• David D. Hall · Corvallis, US
• Gerald F. Hein · Cincinnati, US
• Antonius Hurkmans · Taylorsville, US
• William T. McCarthy · Indianapolis, US
• Gerrit Jan van der Kolk · Eindhoven, NL

Key dates

• Filing date: Jan 8, 2001
• Grant date: Jan 7, 2003
• Expiry date: Jan 8, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/12847
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a method of applying a coating by physical vapour deposition onto an article of organic material, in particular of non- conductive organic material such as plastic and/or epoxy material, especially ABS (Acrylonitrile-Butadiene-Styrene Copolymers) and polymers with high temperature resistance, or onto an article of another composition coated with such organic material, wherein a Cr layer is deposited on the article prior to deposition of said coating to form a diffusion barrier for water coming from said article, said Cr layer itself being deposited by a physical vapour deposition process comprising at least the following steps:a) depositing a first layer of Cr on said article in a physical vapour deposition apparatus using an arc evaporator or cathode sputtering source, or in a combined arc evaporator and cathode sputtering apparatus, using zero bias, andb) subsequently applying a negative bias voltage to said article having said first layer of Cr and depositing a further layer of Cr on said first layer using Cr ions in the same physical vapour deposition apparatus.