Lithographic fabrication of nanoapertures
US6503409B1 · kind B1 · utility
48Cited by
9References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 25, 2000 |
| Grant date | Jan 7, 2003 |
| Priority date | — |
| Expiry date | May 25, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/48721
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A new class of silicon-based lithographically defined nanoapertures and processes for their fabrication using conventional silicon microprocessing technology have been invented. The new ability to create and control such structures should significantly extend our ability to design and implement chemically selective devices and processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.