Cyclosilane compound, and solution composition and process for forming a silicon film
US6503570B2 · kind B2 · utility
37Cited by
3References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2001 |
| Grant date | Jan 7, 2003 |
| Priority date | — |
| Expiry date | Mar 12, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0262
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiro[4.4] nonasilane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.