Patent · US Expired

Method of manufacturing a thin film transistor-integrated color filter

US6503772B1 · kind B1 · utility

24Cited by
5References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 7, 1999
Grant dateJan 7, 2003
Priority date
Expiry dateDec 7, 2019

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/136222
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of manufacturing a thin film transistor-integrated color filter for use in a liquid crystal display element including a step of manufacturing a substrate for use in liquid crystal display by arranging and forming a thin film transistor and a transparent conductive film on a transparent substrate and a step of bringing the substrate for use in the liquid crystal display into contact with an aqueous electrodeposition solution containing a colorant, supplying an electric current, thereby electrochemically changing the concentration of hydrogen ions to deposit the colorant on the transparent conductive film of the substrate for use in liquid crystal display to form a colored conductive electrodeposition film. A thin film transistor-integrated color can be formed by repeating the electrodeposition film forming steps while changing the hues for the colorant, with no requirement for the alignment between the color filter and the substrate formed with the thin film transistor, a reduced number of steps, having high resolution power and high controllability, at low cost and higher performance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.