Photolithographic method for fabricating organic light-emitting diodes
US6506616B1 · kind B1 · utility
19Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2000 |
| Grant date | Jan 14, 2003 |
| Priority date | — |
| Expiry date | Nov 16, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/873
Abstract
A method of photolithographically patterning an organic semiconductor device, comprising the steps of protecting the organic layer of the device by depositing a metal layer thereon, depositing and patterning a photoresist layer on said metal layer, and selectively etching the exposed areas to pattern said metal layer and said organic layer. Specifically, the disclosed method provides the photolithographic fabrication of organic light emitting diodes (OLEDs) and organic lasers diodes (OLDs).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.