Lens system for maskless photolithography
US6509955B2 · kind B2 · utility
32Cited by
48References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2001 |
| Grant date | Jan 21, 2003 |
| Priority date | — |
| Expiry date | May 16, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2032
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for performing digital lithography onto a subject is provided. The system utilizes pixel panels to generate pixel patterns. Mirrors are utilized to divert and align the pixel elements forming the patterns onto a subject. A gradient lens system positioned between the panels and the subject simultaneously directs the pixel elements to the subject. The pixel elements may overlapping, adjacent, or spaced as desired. The pixel elements may be directed to multiple surfaces simultaneously. One or more point array units may be utilized in the system to achieve higher resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.