Patent · US Expired

Poly (arylene ether sulfide) and poly (arylene ether sulfone) for optical device and method for preparing the same

US6512076B2 · kind B2 · utility

2Cited by
2References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 24, 2001
Grant dateJan 28, 2003
Priority date
Expiry dateAug 24, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G75/23
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Disclosed are polyarylene ether sulfides and polyarylene ether sulfones for optical device and a method for preparing the same. Polyarylene ether sulfides containing fluorine and polyarylene ether sulfones containing fluorine are synthesized through polycondensation of pentafluorophenyl sulfide and pentafluorophenyl sulfone monomer with dihydroxy monomer. In addition, by attaching ethynyl phenol and phenylethynylphenol to terminals of the high molecular weight polymer, solvent resistance of the polymer is increased. Thus, the high molecular weight polymers prepared by very simplified process have low light loss, excellent resistance for heat, solvent and water, and so can be used to manufacture inactive optical waveguide devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.