Method of manufacturing film structure, method of manufacturing optical waveguide substrate and method of manufacturing second harmonic generation device
US6513226B2 · kind B2 · utility
4Cited by
5References
9Claims
0Family size
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Key dates
| Filing date | Mar 26, 2001 |
| Grant date | Feb 4, 2003 |
| Priority date | — |
| Expiry date | Jul 2, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49016
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film made of a single crystal of potassium lithium niobate is formed on a substrate made of a single crystal of potassium lithium niobate-potassium lithium tantalate solid solution. In this film formation, a temperature of the substrate is maintained in a range of 700° C.-850° C. and the film is formed by a metalorganic chemical vapor deposition method. By utilizing the film structure mentioned above, it is possible to generate a second harmonic wave in the optical waveguide with high efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.