Gas-assisted atomizing device and methods of making gas-assisted atomizing devices
US6513736B1 · kind B1 · utility
26Cited by
72References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2000 |
| Grant date | Feb 4, 2003 |
| Priority date | — |
| Expiry date | Nov 13, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49432
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Gas-assisted atomizing devices are provided that include liquid orifices, which release liquid, and gas orifices, which release gas to atomize the liquid into droplets. The atomizing devices are formed by at least a first layer and a second layer. The atomizing devices can include a gas supply network and a liquid supply network that supply gas and liquid to the gas and liquid orifices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.