Method for production of electron source substrate provided with electron emitting element and method for production of electronic device using the substrate
US6514559B1 · kind B1 · utility
10Cited by
3References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1998 |
| Grant date | Feb 4, 2003 |
| Priority date | — |
| Expiry date | Mar 19, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A novel process for producing an electron source substrate is disclosed for formation of electron-emitting element at high efficiency with less shape irregularity. In the process, the region for electroconductive film formation is divided into plural subregions on which an electroconductive film is formed respectively. In forming the electroconductive film by application of plural liquids, the time interval between the application of the two drops is controlled to be larger than the time length necessary for suppressing the spreading of the succeedingly applied liquid within an allowable limit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.