Photosensitive composition for lithographic printing plate and photosensitive lithographic printing plate
US6514657B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 17, 2001 |
| Grant date | Feb 4, 2003 |
| Priority date | — |
| Expiry date | Jul 31, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0166
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a photosensitive lithographic printing plate with a long press life, high sensitivity, and excellent storage stability, and a photosensitive composition for a lithographic printing plate for producing such a photosensitive lithographic printing plate. The photosensitive composition for the lithographic printing plate includes (A) a binder resin, (B) a diazo resin, (C) a monomer or oligomer, a molecule of which has at least two polymerizable ethylenically unsaturated double bonds, (D) a photopolymerization initiator, (E) an o-tert-butylphenol derivative, and (F) a 2-mercaptoimidazole derivative such as 2-mercaptobenzimidazole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.