Patent · US Expired

Method for designing and manufacturing a micromechanical device

US6514670B1 · kind B1 · utility

0Cited by

4References

15Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Josef Hirtreiter · Bad Kötzting, DE
Bernhard Elsner · Bad Berka, DE

Key dates

Filing date	Jul 12, 2000
Grant date	Feb 4, 2003
Priority date	—
Expiry date	Jul 12, 2020

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0833
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for designing and manufacturing a micromechanical device providing a substrate having an anchoring region forming a sacrificial layer on substrate while leaving bare the anchoring region depositing an adhesion layer (30) on the sacrificial layer (25) and the anchoring region (20; 120; 220; 320, 325; 420, 425; 620; 755); forming a mask on the adhesion layer; depositing an electroplating layer on the unmasked region of the adhesion layer; and removing the mask and the sacrificial layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.