Gas sensor arrangement
US6516653B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 9, 2001 |
| Grant date | Feb 11, 2003 |
| Priority date | — |
| Expiry date | Apr 9, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/0014
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This invention relates to a gas sensor arrangement in which one or more gas sensors (4) are placed into rooms for monitoring or measuring gas or vapor concentrations or mixtures, a diffusion body (5) is placed in front of the gas sensors (4), the responsiveness of the gas sensors is impaired by structural design or contamination and/or the gas atmosphere is static. The sensor (4) or sensors (4.1 to 4.n) are placed in, on, or in front of a duct (1) located in the room and thus are within the flow area of said duct (1), and a flow is present in the duct (1) during measuring or monitoring. The duct can be artificially heated using a heater (6) to generate this flow.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.