Patent · US Expired

Method of manufacturing spacer, method of manufacturing image forming apparatus using spacer, and apparatus for manufacturing spacer

US6517399B1 · kind B1 · utility

30Cited by
17References
35Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 21, 1999
Grant dateFeb 11, 2003
Priority date
Expiry dateSep 21, 2019

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2329/8655
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

This invention has as its object to easily form a low-cost spacer having a low-resistance film (electrode) without using any exhaust device. This invention provides a method of manufacturing a spacer interposed between the first substrate having an image forming member and the second substrate having an electron-emitting device, including the steps of preparing a glass preform, stretching part of the glass preform while heating the glass preform by a heater, and cutting the stretched glass preform into a desired length, wherein the stretching step has the step of feeding the glass preform at a velocity v1 toward the heater, and stretching the glass preform heated by the heater in a direction away from the heater at a velocity v2, and the velocities v1 and v2 have different speeds and satisfy a relation: v1<v2.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.