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US6517403B1 · kind B1 · utility

11Cited by
8References
44Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMar 31, 2000
Grant dateFeb 11, 2003
Priority date
Expiry dateMar 31, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2329/92
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The apparatus for sealing face plates (753) and cathodes (754) has three stations (701, 702, 703). The first (701) is a preheater, the second (702) is an alignment and irradiation station and the third (703) is a controlled cooling station. Beneath each station, a vacuum pump (710) capable of drawing ultralow pressures is provided. The preheater is equipped with upper and lower banks of radiant heaters and reflectors (712). The upper heaters are Provided above a quartz: window (713) of a chamber (714) constituting the station. The pressure in the preheater is pumped down to that in the alignment and irradiation station prior to opening of the gate valve between them and transfer of the face plate and cathode. At the alignment and irradiation station, further heaters (716) are provided. Those above the face plate and cathode, the face plate being uppermost, are mounted on frames (717) about hinges (718), whereby they can be swung up to clear this station's top quartz window, exposing the face plate to the view of an optical system (719) and a laser (720). Manipulation controls (722) are provided for manipulating the position of the face plate to be pixel alignment, as measured by th…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.