Grating fabrication process using combined crystalline-dependent and crystalline-independent etching
US6517734B1 · kind B1 · utility
8Cited by
9References
39Claims
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Key dates
| Filing date | Sep 26, 2000 |
| Grant date | Feb 11, 2003 |
| Priority date | — |
| Expiry date | Apr 7, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1809
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A diffraction grating is fabricated by forming two sets of parallel trenches in a crystal surface, one set with a crystalline-independent etching technique and the other made with a chemically crystalline-dependent etchant. The intersection of the two sets of trenches removes material from the crystal surface to produce an etched crystal surface that can be coated with a reflective material to form the diffraction grating or can be used as a master for batch fabrication of diffraction gratings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.