Patent · US Expired

System and process for gas recovery

US6517791B1 · kind B1 · utility

7Cited by
6References
8Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 4, 2000
Grant dateFeb 11, 2003
Priority date
Expiry dateDec 4, 2020

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B2210/0031
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

This invention is directed to a three-stage process for recovering and purifying a helium gas, and a system for using the three-stage process. The steps comprises a) introducing a gas from a cold spray forming chamber to a particulate removing apparatus to form a particulate-free helium gas, and recycling a first portion of the particulate-free helium gas back to the chamber; b) passing a second portion of the particulate-free helium gas to a first compressor prior to passing a helium gas purification membrane to form a purified helium gas and an exhaust gas, and passing the purified helium gas to mix with the first portion of particulate-free helium gas to the chamber; and c) passing a third portion of the particulate-free helium gas to a liquid separator apparatus to remove water and a receiver to dampen any pulsation to form a liquid-free helium gas, and recycling the liquid-free helium gas to said cold spray forming chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.