Particle manipulation
US6517912B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 29, 1999 |
| Grant date | Feb 11, 2003 |
| Priority date | — |
| Expiry date | Nov 29, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/84
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a method for manipulating particles arranged in a plasma-cristalline state in a plasma of a carrier gas, the particles are at least partially subject to plasma treatment and/or applied to a substrate surface. A device for manipulating of particles in plasma-cristalline state includes a reaction vessel, in which plasma electrodes and at least one substrate are situated. An adaptive electrode for formation of a location selective low frequency or static electrical field in the reaction vessel is described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.