Patent · US Expired

Particle manipulation

US6517912B1 · kind B1 · utility

16Cited by
15References
30Claims
0Family size

Assignees

Inventors

Key dates

Filing dateNov 29, 1999
Grant dateFeb 11, 2003
Priority date
Expiry dateNov 29, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/84
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

In a method for manipulating particles arranged in a plasma-cristalline state in a plasma of a carrier gas, the particles are at least partially subject to plasma treatment and/or applied to a substrate surface. A device for manipulating of particles in plasma-cristalline state includes a reaction vessel, in which plasma electrodes and at least one substrate are situated. An adaptive electrode for formation of a location selective low frequency or static electrical field in the reaction vessel is described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.