Radiation-sensitive, positive working coating composition based on carboxylic copolymers
US6517988B1 · kind B1 · utility
1Cited by
18References
41Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2001 |
| Grant date | Feb 11, 2003 |
| Priority date | — |
| Expiry date | Jul 30, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the composition are disclosed. The composition comprises at least one quinonediazide compound and at least one carboxylic copolymer. The compositions produce lithographic printing plates that show high print run stability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.