Patent · US Expired

Method of fabricating a submicron narrow writer pole

US6521335B1 · kind B1 · utility

6Cited by
13References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 2, 1999
Grant dateFeb 18, 2003
Priority date
Expiry dateMar 2, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/265
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A writer pole and a method for fabricating a writer pole is disclosed. The method comprises fabricating a conductive seed layer on a gap substrate and then fabricating a nonmagnetic feature on the seed layer where the nonmagnetic feature has a top layer and a plurality of sides. The seed layer and nonmagnetic feature are covered with photoresist. A window is fabricated in the photoresist, exposing a portion of the nonmagnetic feature and a portion of the seed layer, thereby exposing a top portion and a side portion of the nonmagnetic feature and exposing a portion of the seed layer. The portion of the seed layer in the window area is removed from the gap substrate. A pole is fabricated on the top and side portions of the nonmagnetic feature in the window area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.