Control of magnetic film grain structure by modifying Ni-P plating of the substrate
US6524724B1 · kind B1 · utility
15Cited by
20References
15Claims
0Family size
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Key dates
| Filing date | Feb 9, 2001 |
| Grant date | Feb 25, 2003 |
| Priority date | — |
| Expiry date | Mar 11, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
High areal density magnetic recording media exhibiting low noise are formed with a Ni—P—X plating layer, in which X is an additive meeting the following requirement: (1) The additive has a higher oxidation potential than that of Ni so that grains of an additive-rich-oxide will form first during oxidation under a controlled atmosphere and grains of a Ni-rich-oxide, if any, will form subsequently and separately from the grains of the additive-rich oxide. (2) The additive has a tendency to segregate to the top surface. (3) The additive is not a catalyst poison for Ni—P plating in the composition range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.