Patent · US Expired

Chemically resistant polythiothers and formation thereof

US6525168B2 · kind B2 · utility

70Cited by
15References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 9, 2001
Grant dateFeb 25, 2003
Priority date
Expiry dateMar 9, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L81/02
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A polythioether comprising:R4—S&Brketopenst;R1—S—CH2CH2—(R2)m—S&Brketclosest;nR1SR4wherein R1 is a C1-10 alkyl, —(R3Q)pR3— or C6-C20 aryl where Q is O or S, each R3 is independently C1-6 alkyl, and p is an integer between 0 and 6; R2 is C1-6 alkyloxy or C5-12 cycloalkyloxy, R4 is H, C1-6 alkyl, C1-6 alkyl alcohol and C0-6 alkyl substituted with &Brketopenst;CH2CH2(R2)m&Brketclosest;X, where X is a halogen, m is an integer between 1 and 4, and n is an integer selected to yield a molecular weight for said polythioether of between 1000 and 10,000 Daltons.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.