Rayleigh scattering optical flux monitor
US6525820B1 · kind B1 · utility
3Cited by
6References
52Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 30, 1999 |
| Grant date | Feb 25, 2003 |
| Priority date | — |
| Expiry date | Dec 30, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B23/066
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device for in situ real time monitoring of atomic and molecular fluxes by use Rayleigh scattering. The flux can be generated by an effusion cell during molecular beam epitaxy. The present device uses a coherent light source, such as a helium neon laser, a high precision mirror assembly capable of providing an effective number of reflections though the flux beam and an interferometer detector to track the changes in flux.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.