Patent · US Expired

Process for the manufacture of a plasma panel

US6527606B1 · kind B1 · utility

3Cited by
3References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 13, 2000
Grant dateMar 4, 2003
Priority date
Expiry dateApr 13, 2020

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2211/36
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The present invention relates to a process for the manufacture of a plasma panel comprising two tiles facing each other and containing a plasma discharge gas, at least one of the tiles having an array of electrodes serving to define a number of discharge cells and an array of supporting barriers delimiting the cells, the barriers being made of a material giving them a high and open porosity. According to the process, the barriers 30 are formed in a single step using a paste comprising the said material and an organic resin.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.