Metal complex for ink jet ink
US6527844B2 · kind B2 · utility
4Cited by
12References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 27, 2001 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Apr 27, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09B45/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An ink jet ink composition comprising water, a humectant, a polyvalent transition metal complex of an 8-heterocyclylazo-5-hydroxy-quinoline and an anti-kogation material comprising an alkali metal salt of a monobasic organic or inorganic acid. Examples of anti-kogation materials useful in the invention include sodium hexanoate, sodium sulfate, sodium propionate, sodium benzoate, sodium p-toluenesulfonate, sodium acetate, sodium bromide, sodium nitrate, potassium nitrate, lithium nitrate, lithium acetate, tetramethylammonium acetate and tetrabutylammonium bromide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.