Coating composition
US6527847B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 30, 2000 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Nov 30, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02628
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating composition comprising a silicon compound represented by the following formula (1):SinX1n  (1)wherein X1 is a hydrogen atom or a halogen atom, and n is an integer of 4 or more, on the proviso that n occurrences of X1 may be the same as or different from one another, or a modified silane compound represented by the following formula (2):SinX2mYl  (2)wherein X2 is a hydrogen atom or a halogen atom, Y is a boron atom or a phosphorus atom, n is an integer of 3 or more, l is an integer of 1 or more, and m is an integer of n to 2n+3, on the proviso that m occurrences of X2 may be the same as or different from one another, and solvent thereof. This coating composition is suitably used in the production of a device for forming a silicon film or a boron- or phosphorous-doped silicon film on a substrate having a large area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.