Vacuum treatment system
US6527927B1 · kind B1 · utility
0Cited by
6References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 5, 2000 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Jul 1, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A vacuum treatment system in which a part (9) is provided inside a vacuum treatment chamber (1). A potential (&phgr;9) which deviates from the system reference potential (&phgr;0) by approximately at least ±12 V is applied to said part. A sensor and/or an actuator (11) is/are arranged on said part. In addition, the invention comprises an electronic unit (13) which is connected to the sensor and/or actuator. Processing signals on the unit (13) is considerably simplified in that the electronic unit (13) is operated as a reference potential on the potential (&phgr;9) of said part (9).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.