Chemical resistant underlayer for positive-working printing plates
US6528228B2 · kind B2 · utility
18Cited by
3References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 5, 2000 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Feb 13, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41C2210/262
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Multilayer photoimageable elements, useful for forming lithographic printing members, are disclosed. The elements comprise a support, a top layer, and a chemical resistant underlayer. The underlayer is resistant to aggressive washes, such as a UV wash. In one embodiment, the underlayer comprises a copolymer of N-substituted maleimide, methacrylamide, and methacrylic acid. A process for preparing a lithographic printing member is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.