Patent · US Expired

Chemical resistant underlayer for positive-working printing plates

US6528228B2 · kind B2 · utility

18Cited by
3References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 5, 2000
Grant dateMar 4, 2003
Priority date
Expiry dateFeb 13, 2021

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB41C2210/262
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

Multilayer photoimageable elements, useful for forming lithographic printing members, are disclosed. The elements comprise a support, a top layer, and a chemical resistant underlayer. The underlayer is resistant to aggressive washes, such as a UV wash. In one embodiment, the underlayer comprises a copolymer of N-substituted maleimide, methacrylamide, and methacrylic acid. A process for preparing a lithographic printing member is also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.