Methods for making patterns in radiation sensitive polymers
US6528238B1 · kind B1 · utility
Inventors
Key dates
| Filing date | Sep 22, 2000 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Oct 14, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Groove patterns on substrates coated with photoresist are made using the technique of photolithography by exposing photoresist via a reticle. In the instant invention, the pattern is provided on the reticle with a period larger than the final period to be printed on the photoresist. The complete pattern is obtained by subjecting the photoresist to two or more exposures and aligning the substrate relative to the reticle between exposures. In a further embodiment the slits on the reticle defining the line width of the grooves are larger than required and photoresist is subjected to multiple partial exposure. Both embodiments significantly reduce diffraction caused by the reticle and improve the resolution of the technique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.