Copolymers containing polyamide blocks and polyether blocks based on ethoxylated amines
US6528615B2 · kind B2 · utility
1Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2001 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Mar 26, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S526/935
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to copolymers containing polyamide blocks and polyether blocks based on ethoxylated primary amines, these copolymers having a melting point of between 80° C. and 135° C. and an MFI (melt flow index) of between 5 and 80 g/10 min (2.16 kg-150° C.).The invention also relates to adhesives of the HMA (or hot melt adhesive) type consisting of the above copolymers containing polyamide blocks and polyether blocks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.