Absorbing layer for minimizing substrate exposure during the UV writing of a waveguide grating in addition to a birefringent control system
US6529668B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 1, 2001 |
| Grant date | Mar 4, 2003 |
| Priority date | — |
| Expiry date | Feb 1, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/13
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A waveguide having photosensitive properties is disclosed comprising: a waveguide substrate; a first cladding layer formed on the waveguide substrate; a UV absorbing layer formed on the first cladding layer; a UV sensitive layer having optical transmission properties adapted to be changed with UV irradiation, the layer formed on or closely adjacent the UV absorbing layer; and a second cladding layer, being substantially UV transparent, on the UV sensitive layer. Preferably, there is further provided a third cladding layer intermediate of the UV absorbing layer and the UV sensitive layer. The UV absorbing layer comprises a germanosilicate material. The absorbing layer can be adapted to change a physical property upon UV absorption. The UV absorbing layer can be variable thickness, the thickness being in accordance with predetermined requirements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.