Abatement of semiconductor processing gases
US6530977B2 · kind B2 · utility
6Cited by
9References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 1, 2001 |
| Grant date | Mar 11, 2003 |
| Priority date | — |
| Expiry date | Mar 1, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/0216
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for the abatement of one or more pyrophoric gases in a gas stream, which includes introducing water in to the gas stream and/or mixing the gas stream with preheated air and introducing the gas stream in to a container in which the pyrophoric gases are abated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.