Patent · US Expired

Methods for producing fused silica glass

US6532767B1 · kind B1 · utility

0Cited by
2References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 12, 2000
Grant dateMar 18, 2003
Priority date
Expiry dateSep 12, 2020

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S65/13
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

Methods for producing high purity fused silica (HPFS) glass having desired levels of dissolved hydrogen are provided. The methods involve measuring the level of hydrogen in the cavity of the furnace used to produce the glass and controlling the pressure within the furnace and/or gas flows to the furnace's burners so that the measured concentration has a desired value. In this way, the level of dissolved hydrogen in the glass can be controlled since, as shown in FIG. 3, there is a direct correlation between the hydrogen concentration in the cavity atmosphere and level of dissolved hydrogen in the glass.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.