Ultraviolet processing apparatus and ultraviolet processing method
US6533902B1 · kind B1 · utility
6Cited by
1References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 2001 |
| Grant date | Mar 18, 2003 |
| Priority date | — |
| Expiry date | Mar 27, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2201/3228
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An ultraviolet light reaction system is constructed for surface cleaning/surface processing, a processing speed and an apparatus size that can not be attained by any conventional chemical reaction system, are realized, and realization of a time-sharing performance/a high-throughput performance/a compact size is intended. Using an excimer ultraviolet lamp whose light source is excimer ultraviolet rays of a wavelength that transmissive distances to air, gas, and water are 2 mm or more, respectively, surface processing (such as a surface cleaning process) of a substrate disposed in a one-by-one substrate chamber is preformed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.