Semiconductor purification apparatus and method
US6534748B1 · kind B1 · utility
6Cited by
4References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2001 |
| Grant date | Mar 18, 2003 |
| Priority date | — |
| Expiry date | Feb 15, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for protecting at least one wafer from contamination, the method including the steps of heating the wafer in an apparatus for semiconductor processing having a reaction core (102), providing a first voltage level to a wafer transfer device (108), and providing a second voltage level lower than the first voltage level, near the reaction core (102), thereby activating the protection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.