Electron beam device
US6534911B1 · kind B1 · utility
15Cited by
8References
45Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 28, 2000 |
| Grant date | Mar 18, 2003 |
| Priority date | — |
| Expiry date | Nov 28, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/866
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam device comprising an electron source having an electron-emitting device, a member to be irradiated with an electron beam disposed opposite to the electron source, and an electrically conductive spacer disposed between the electron source and the member to be irradiated with the electron beam, is characterized in that an electrode is disposed along an end portion of the spacer on the electron source side, and the electrode is disposed inside a region of a surface of the end portion of the spacer which is directed toward the electron source side.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.