Patent · US Expired

Method and apparatus for manufacturing electron source, and method manufacturing image forming apparatus

US6534924B1 · kind B1 · utility

17Cited by
3References
69Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 9, 1999
Grant dateMar 18, 2003
Priority date
Expiry dateJun 9, 2019

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2329/00
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

This invention discloses an electron source manufacturing method including the step of applying a voltage to a plurality of conductive members by applying a potential to first portions of the plurality of conductive members serving as at least part of electron-emitting devices via a wiring commonly connected to the plurality of conductive members, and applying a potential to second portions of the plurality of conductive members, wherein the potential applied to the second portions of the plurality of conductive members is set to relax the difference in voltage applied to the plurality of conductive members owing to the difference between potentials at portions respectively connected to the first portions of the plurality of conductive members in the wiring commonly connected to the plurality of conductive members.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.