Eye characteristic measuring apparatus
US6536900B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2001 |
| Grant date | Mar 25, 2003 |
| Priority date | — |
| Expiry date | Apr 24, 2021 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/1015
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The present invention is intended to provide an eye characteristic measuring apparatus having a projection system for projecting a light source image of small amount onto a fundus of an eye by a reflected light from the fundus, and a wavefront detecting system for detecting a wavefront of luminous flux emitted from the interior of the pupil of the eye by a reflected light from the fundus, where the projection system projects a light source image of small amount onto a fundus of an eye, and the wavefront detection system detects the wavefront of luminous flux emitted from the interior of the fundus by a reflected light from the fundus, and a deflection prism having at least one transmission surface for aberration correction within both optical paths of the projecting system and the wavefront detecting system, can deflect the incident luminous flux.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.