Method of prevention of particle pollution in a pre-clean chamber
US6537622B2 · kind B2 · utility
2Cited by
3References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 4, 2001 |
| Grant date | Mar 25, 2003 |
| Priority date | — |
| Expiry date | Sep 20, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This method of prevention of particle pollution in a pre-clean chamber includes an oxygen gas supplying step for injecting oxygen gas into the pre-clean chamber; and a plasma generating step for ionizing the oxygen gas into plasma so as to interact with silicon-rich oxide to form a silicon oxide layer in the pre-clean chamber. The method according to the invention could prevent particle pollution due to peeling-off of silicon-rich oxide in a pre-clean chamber so as to prolong the life of a bell-jar therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.