Magnetic pole fabrication process and device
US6540928B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 8, 2000 |
| Grant date | Apr 1, 2003 |
| Priority date | — |
| Expiry date | Nov 26, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49032
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for fabricating an electroplating mask for the formation of a miniature magnetic pole tip structure. The method incorporates a silylation process to silylate photoresist after creating a photoresist cavity or trench in the electroplating mask. The silylation process is performed after a dry etch of the photoresist. Alternatively, silylation is performed after a lithographic patterning of the trench. As a result of chemical biasing, the vertical side walls of the photoresist layer shift inward creating a narrower trench. The resulting structure formed after electroplating has a width of less than 0.3 micrometers. This structure can be used as a magnetic pole of a thin film head (“TFH”) for a data storage device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.