Process for producing an article with a microstructure
US6541187B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2000 |
| Grant date | Apr 1, 2003 |
| Priority date | — |
| Expiry date | Mar 29, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0015
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for producing an article with a microstructure includes the steps of forming a primary relief structure on a surface of a substrate, applying a photo resist on the substrate, exposing part of the photo resist using a photo mask so as to form a microstructure pattern, developing the microstructure pattern in the exposed photo resist, thereby allowing access to a part of the primary relief structure from the photo resist, and thereby forming a patterned surface with a microstructure relief that is bounded by the exposed part of the primary relief structure and by remainder of the photo resist on the substrate, and forming a metal layer on the patterned surface to form the article having the microstructure with a profile corresponding to the microstructure relief on the patterned surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.