Combined plasma/liquid cleaning of substrates
US6546938B2 · kind B2 · utility
5Cited by
5References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2001 |
| Grant date | Apr 15, 2003 |
| Priority date | — |
| Expiry date | Mar 8, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Apparatus and method for cleaning substrates. A substrate is held and rotated by a chuck and an atmospheric pressure plasma jet places a plasma onto predetermined areas of the substrate. Subsequently liquid rinse is sprayed onto the predetermined areas. In one embodiment, a nozzle sprays a gas onto the predetermined areas to assist in drying the predetermined areas when needed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.