Device and method for fabricating diffractive gratings
US6547919B2 · kind B2 · utility
4Cited by
4References
8Claims
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Key dates
| Filing date | Apr 6, 2001 |
| Grant date | Apr 15, 2003 |
| Priority date | — |
| Expiry date | Apr 13, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1857
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is provided a grating fabrication device and method to form gratings on a semiconductor substrate. The substrate is loaded into a reactor filled with an etchant solution, and an array of parallel light of interference light with different periods is projected onto the substrate to etch the portion of the substrate that is exposed to the light via an oxidation-reduction reaction. At the same time, the inclination angle of the substrate is selectively varied to obtain the different grating periods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.